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- Article name
- Formation of high-temperature superconductor targets
- Authors
- GRIGORASHVILY Y. E., , scme@miee.ru, Moscow Institute of Electronic Technology, Moscow, Russia
BUKHLIN A. V., , scme@miee.ru, Moscow Institute of Electronic Technology, Moscow, Russia
VERUZHSKY I. V., , vervan2005@mail.ru, Moscow Institute of Electronic Technology, Moscow, Russia
- Keywords
- high temperature superconductor / composite material / target / magnetron sputtering
- Year
- 2010 Issue 2 Pages 41 - 45
- Code EDN
- Code DOI
- Abstract
- We present a technology for manufacturing of targets from composite Bi2Sr2Ca2Cu3Ox superconductor material doped with lead oxide for in the form of volumetric mesh. The target is intended for magnetron sputtering of layers of high-temperature superconductor with critical temperature of 110 K and thickness up to 100 nm. The target is stable against cracks during thermal work cycles; the target has reliable thermal contact with the magnetron base that allows excludе surface composition changes during sputtering.
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