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- Article name
- Control of the power characteristics of ion flow in plasma processing reactor on the basis of beam plasma discharge
- Authors
- Klykov I. L., , , V. A. Kotelnikov Institute of Radio Engineering and Electronics of RAS Fryazino branch, 1 Vvedensky sq., 141190, Fryazino, Moscow Region, Russia
Shustin E. G., , shustin@ms.ire.rssi.ru, V. A. Kotelnikov Institute of Radio Engineering and Electronics of RAS Fryazino branch, 1 Vvedensky sq., 141190, Fryazino, Moscow Region, Russia
Isaev N. V., , , V. A. Kotelnikov Institute of Radio Engineering and Electronics of RAS, 1 Vvedensky sq., 141190, Fryazino, Moscow Region, Russia
- Keywords
- generation / plasma beam discharge / ionic stream / plasma chemical reactor
- Year
- 2009 Issue 6 Pages 113 - 117
- Code EDN
- Code DOI
- Abstract
- Earlier we have detected effect of generation of ion flow from a discharge axis in beam plasma discharge. There has been shown, that on the basis of this effect plasma processing reactor for can be created for low energy etching of semiconductor structures. Possibility of simple control of ion stream density and energy is shown here by change of a potential of a collector of discharge. The means of compensation of an ion stream charge incident on a non-conducting surface with the help of modulation of a potential of a substrate holder have been implemented, and also by modulation of a potential of plasma.
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