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- Article name
- Deposition parameter influence on indium film microstructure
- Authors
- Klimanov E. A., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
Sednev M. V., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
Kardonov N. V., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
Lialikov A. V., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
Mezin Yu. S., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
Troshin B. V., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
Sharonov Yu. P., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
- Keywords
- microstructure / films / vacuum chamber / indium / residual gases
- Year
- 2012 Issue 3 Pages 66 - 69
- Code EDN
- Code DOI
- Abstract
- Results of investigation of the preparation parameters at indium films structure formation are obtained. It is shown that microstructure is a function of deposition variables including impurities in vacuum chamber, deposition rate and substrate temperature. The results are describing in terms of the structure zone model (SZM).
- Text
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