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- Article name
- Formation of indium microcontacts by ion etching
- Authors
- Korneeva M. D., , orion@orion-ir.ru, Orion R&P Association, 9 Kosinskaya str., Moscow, 111402, Russia
Sednev M. V., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
Boltar K. O., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
Mezin Yu. S., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
- Keywords
- microcontact / etching / evaporated layer / indium / ion-beam method
- Year
- 2011 Issue 1 Pages 96 - 100
- Code EDN
- Code DOI
- Abstract
- In this work the results of research of processes ion beam and high-frequency cathode etching of evaporated indium layers for formation of microcontacts are submitted. The matrixes of microcontacts of height more than 10 microns with a step 28 microns of the 384×288 format are made. The width of a flute dividing (sharing) indium microcontacts does not exceed 5 μm.
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